Abstract:High-power impulse magnetron sputtering (HiPIMS), a new physical vapor deposition technique which combines the advantages of the high ionization rates of the sputtered materials and control of electromagnetism, has been widely used to deposit high-performance coatings with a large density and high adhesion. However, HiPIMS has some intrinsic disadvantages such as the low deposition rate, unstable discharge, and different ionization rates for different materials thereby hampering wider industrial adoption. We have recently designed an optimized cylindrical source based on the hollow cathode effect to circumvent the aforementioned limitations. However, during the operation of the cylindrical source, the discharge is inhomogeneous and the etching stripes are nonuniform. In order to determine the underlying mechanism and optimize the electromagnetic control, the discharge in the HiPIMS cylindrical source is simulated. The tangential magnetic field distribution on the target surface of the cylindrical sputtering source is inhomogeneous and electron runaway is serious, resulting in a relatively low plasma density. Two solutions are proposed to improve the situations. The first one is electrical improvement by installing an electron blocking plate, and the second one is magnetic improvement by adding compensating magnets. Our simulation results of the first method show that a potential well is produced by the electron blocking plate to suppress electron runaway and the plasma density is improved significantly, especially around the central cross-section of the cylindrical sputtering source. The discharge becomes homogeneous, and the etching stripes are uniform albeit not full enough. The second method of magnetic improvement significantly improves the homogeneity of the tangential magnetic field distribution on the target surface and the target utilization rate. After adding the optimized compensating magnets, the shape of the effective area (the value of the tangential magnetic field in a range of 25-50 mT) on the target surface can be controlled and made zonal. The target utilization rate increases to over 80% from 60%. In order to obtain the optimal conditions, the two techniques are combined. A larger and more homogeneous etching ring is observed by adopting both the electrical and magnetic improvements as predicted and explained by the simulation results. It can be concluded that the combination of the two improvement techniques can improve and optimize the HiPIMS cylindrical source.

Macroparticle Reduction and Its Transport Mechanism Through a Magnetic Filter During Cathodic Vacuum Arc Deposition with an HEA Target

A flexible curvilinear electromagnetic filter for direct current cathodic arc source.

Effects of Pulsing Frequencies on Macro-Particle Contamination During Pulsed Vacuum Arc Deposition

Effects of Pulsing Parameters on Production and Distribution of Macroparticles in Cathodic Vacuum Arc Deposition

Transport Efficiency of Vacuum Arc Plasma in a Curved Magnetic Filter

Modeling of Macro-Particles in Vacuum Arc Jet Before Current Zero with Axial Magnetic Field

Magnetic Field Optimization and High-Power Discharge Characteristics of Cylindrical Sputtering Cathode

Research Status of Removal Methods for Macroparticles Defects in Arc Ion Plating Process

Simulation of Magnetic-Field-Induced Ion Motion in Vacuum Arc Deposition for Inner Surfaces of Tubular Workpiece

Simulation Of The Interaction Between High Current Vacuum Arc And Macroparticles In Small-Size Trigatron

Numerical Investigation on the Influence of Metal Particles on the Characteristics of a High-Current Vacuum Arc

Modeling of Interaction Between Arc and Macroparticle in Vacuum Trigatron

Discharge Characterization and Technological Application of an Arc Ion Plating with a Hollow Cathode Vacuum Arc

Simulation Study on Plasma Discharge and Transport in Cylindrical Cathode Controlled by Expanding Electromagnetic Field

Deposition of ultrathick heavy-metal alloys on rotating substrates by high-power impulse magnetron sputtering: Target erosion effects

Effects of selected cathode materials on a magnetically enhanced vacuum arc thruster

Study and Elimination of the Cathode Etching on Large Beam-Anode Layer Ion Source

Electromagnetic Control and Optimization of High Power Impulse Magnetron Sputtering Discharges in Cylindrical Source

Cathode etching phenomenon of high beam-anode ion source and its elimination measures

Enhanced Discharge and Microstructure of the Ta-C Coatings by Electromagnetically Enhanced Cathodic Arc at Argon Atmosphere

High-rate deposition of ultra-thick silver film by hollow cathode magnetron sputtering