Controllable Semiconductor Flexoelectricity by Interface Engineering

Zhiguo Wang,Renhong Liang,Yongming Hu,Chunchun Li,Fei Li,Shanming Ke,Longlong Shu
DOI: https://doi.org/10.1063/5.0097238
IF: 4
2022-01-01
Applied Physics Letters
Abstract:Flexoelectricity of semiconductors usually exhibits large flexoelectric coefficients due to their significantly enhanced surface piezoelectricity caused by surface symmetry breaking. In this Letter, we reported a general paradigm to tune the semiconductor flexoelectricity through interface engineering. We selected Nb-SrTiO3 (Nb-STO) single crystals as the targets and tuned their surface piezoelectricity through depositing TiO2-terminated and SrO-terminated ultra-thin BaTiO3 (BTO) films. The results suggested that the deposition of TiO2-terminated and SrO-terminated ultra-thin BaTiO3 films to Nb-STO can induce a downward and upward out-of-plane surface polarization, respectively, thereby significantly increasing/decreasing the apparent flexoelectric coefficients of Nb-STO single crystals. Our work proves the feasibility of interface engineering in the application of flexoelectricity and also provides a possible route to achieve the large apparent flexoelectricity of semiconductor materials.
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