Removal of Trace Gaseous H2s by a Ts-1/H2o2 Wet Oxidation System

quan wang,ying chen,yong chen,dong chen,xiubo tian,jiawen zhou,xiaohong li,yan wang
DOI: https://doi.org/10.2139/ssrn.4167059
2022-01-01
SSRN Electronic Journal
Abstract:A wet oxidation system of TS-1/H 2 O 2 was proposed for H 2 S removal in this study, the effects of the H 2 O 2 and TS-1 dosage, as well as reaction temperature and time on the removal rate of H 2 S (η) were investigated. Samples were characterized by TEM, XRD, FT-IR, and N 2 adsorption-desorption. A quenching experiment was carried out as well to verify the active substance. The results show that η reached 86.3% when bubbling 160 ppm H 2 S through a 500 mL solution (pH 4.21) containing TS-1 (0.5 g/L) and H 2 O 2 (0.33 mol/L) at 293 K and with a flow rate of 265 mL/min. Within 20 h, the η and pH gradually decreased to 80.4% and 2.10, respectively. Subsequently, the mechanism of the reaction was proposed: H 2 S and H 2 O 2 molecules diffuse to the surface of TS-1 and both are activated by adsorption. The activated H 2 S is then oxidized to H 2 SO 4 . It is inferred that the strong chemisorption of H2S on very few highly active sites result in a slight reduction in the catalytic performance of used TS-1. While the catalytic activity can be restored by calcining used TS-1 in air at 673 K for 2 h. The removal of hydrogen sulfide by the TS-1/H 2 O 2 system is a green, simple, low-cost and efficient method, which could provide an essential theoretical basis for the following developments of this new gaseous hydrogen sulfide removal process.
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