Bipolar Resistive Switching Characteristics and Mechanism in the TiN/SiOx/Pt Structure

Hai-Xia Gao,Xi-Xi Gu,Jiang-Zhou Guo,Yin-Tang Yang
DOI: https://doi.org/10.1109/icsict.2016.7998665
2016-01-01
Abstract:A TiN/SiO x /Pt structure was fabricated at room temperature and its resistive switching behaviors were investigated. The device demonstrated a bipolar resistive switching behavior, good stability and excellent scalability. The size effect of resistance and the resistive memory behavior can be explained based on conducting filaments (CFs) composed of oxygen vacancies. The resistive switching behavior is then explained by the rupture and the formation of filaments near the TiN electrode. It is found that the electric field and temperature have played an important role in ion migration.
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