Band structures of molecular beam epitaxially grown MoSe<sub>2</sub>-WSe<sub>2</sub> heterobilayers with different stacking orders on SrTiO<sub>3</sub>(111) substrate

Junyu Zong,Ziyu Wang,Kaili Wang,Qinghao Meng,Qichao Tian,Xiaodong Qiu,Xuedong Xie,Yongheng Zhang,Shaoen Jin,Can Wang,Junwei Liu,Yi Zhang
DOI: https://doi.org/10.1063/5.0102229
IF: 4
2022-01-01
Applied Physics Letters
Abstract:Using SrTiO3(111) as a substrate, we grew WSe2/MoSe2 and MoSe2/WSe2 heterobilayers (HBLs) by molecular beam epitaxy. The in situ scanning-tunneling microscopic measurements revealed that different stacking orders on SrTiO3(111) can result in different interlayer distances d(Mo-W) with d(Mo-W) = 0.77 nm in WSe2/MoSe2/SrTiO3(111) and d(Mo-W) = 0.66 nm in MoSe2/WSe2/SrTiO3(111) separately. A combined study of angle-resolved photoemission spectroscopic measurements and first-principles calculations further demonstrates that the interlayer distance can essentially affect the band structures of MoSe2-WSe2 HBLs. Our work shows that MoSe2/WSe2 and WSe2/MoSe2 HBLs on SrTiO3(111) substrate would be a platform for studying the properties of transition metal dichalcogenides HBLs, and the modulation of interlayer distance by changing the stacking order of a HBL on a substrate would be a freedom to engineer the electronic structures. Published under an exclusive license by AIP Publishing.
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