Near-field imaging of WTe2

Dai Zhen-Bing,Luo Guo-Yu,He Yan,Wang Chong,Yan Hu-Gen,Li Zhi-Qiang
DOI: https://doi.org/10.11972/j.issn.1001-9014.2022.02.013
2022-01-01
JOURNAL OF INFRARED AND MILLIMETER WAVES
Abstract:Near-field optical response of WTe2thin films was studied by using scanning near-field optical microscopy???SNOM??????we have observed bright fringes near the edge of the thin film sample and also a thickness dependence on op???tical contrast to the sample and substrate.To understand this behavior???first we obtain the dielectric function of WTe2atroom temperature by Drude-Lorentz model via fitting the infrared radiation???IR???reflectance and conductivity spectra???then the near-field ratio of thin film sample to the diamond substrate is calculated by the Finite-dipole model.The experi???mental result reveals that the behavior of the sample cannot be fully described by the bulk properties.We assume that adecoupled thin layer exists on the surface of the bulk.There are two possible explanations for the observation of thenear-field patterns of bright outside fringes.Firstly???a hot-spot field may be produced between the tip and the sampleedge due to the enhancement of the local electric field under the IR illumination???a similar behavior has been revealed insurface-metallic black phosphorus.Another probability is that the topological edge states of top decoupled monolayerWTe2lead to an enhancement of the local optical conductivity.This work provides a reference from the optical research of topological materials in the future
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