Enhancement of Atomic Oxygen Resistance for Heat-Sealable Isomeric Co-Polyimide Films by Combining Ether Linkage with Diphenylphosphine Oxide

Hongjiang Ni,Xiaoke Yang,Jun Li,Daijun Zhang,Jingang Liu,Shiyong Yang,Xiangbao Chen
DOI: https://doi.org/10.1177/87560879221102635
2022-01-01
Abstract:Heat-sealable isomeric co-polyimide (CPI) films with enhanced atomic oxygen (AO) resistance and mechanical strength were synthesized from 2,3,3′,4′-oxydiphthalic anhydride (aODPA), 4,4′-oxydianiline (ODA), and 2,5-bis [(4-aminophenoxy)phenyl]diphenylphosphine oxide (BADPO). We investigated how the molecular structure and diamine ratio affected the thermal properties, solubility, mechanical properties, AO resistance and heat-sealability. The diphenylphosphine oxide (DPO) side group decreased the CPI film mechanical strength and its higher ODA reactivity increased the molecular weight. At 10 mol% ODA in the aODPA-BADPO system, the CPI film exhibited increased tensile strength with no detriment to the AO resistance. Meanwhile, the CPI films demonstrated good heat-sealability indicated by a completely merged interface after heat sealing.
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