Pannus Formation and Iatrogenic Ventricular Septal Defect after Transcatheter Aortic Valve Implantation

Yan-Jie Li,Xin Pan,Lan Ma,Ben He,Sabato Sorrentino,Christoph Sinning,Matthew Williams
DOI: https://doi.org/10.1093/ehjcr/ytac265
2022-01-01
European Heart Journal - Case Reports
Abstract:A 72-year-old female with progressive dyspnoea for 3 months underwent transcatheter aortic valve implantation (TAVI) with a 24 mm self-expanding valve (VitaFlow Liberty, China) 2 years ago. During regular follow-up, echocardiography and computed tomography revealed subaortic pannus encroaching from below the frame and causing left ventricular out fl ow tract (LVOT) obstruction ( Figure 1A – D, Video 1 ) without ventricular dilatation. The evaluated mean transvalvular pressure gradient was 52 mmHg ( Figure 1E ). A 4.4 mm perimembranous ventricular septal defect (VSD) was found ( Figure 1F ), which was absent previously (Supplementarymaterial online, Video S1 ). The peak systolic pressure gradient of subaortic pannus was 84 mmHg measured by cardiac catheterization, Qp/Qs ratio was 1.7 and mean pulmonary artery pressure (PAP) was 35 mmHg. An interventional procedure was performed with fl uoroscopy and transesophageal echocardiography guidance under general anaesthesia. Left ventricle angiography demonstrated obstruction of LVOT and left-to-right shunt ( Figure 1G, Video 2 ). A new 24 mm self-expandable valve (VitaFlow, China) was positioned lower than usual to completely cover the pannus and partially seal the aneurysm of membranous ventricular septum without affecting neighbour structures. After the transfemoral valve-in-valve TAVI, the peak transvalvular pressure gradient declined to 0 and mean PAP was 26 mmHg. Ventriculography showed relief of subvalvular obstruction and remarkable reduction of
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