Abstract:Iron nitride films have received attention for many years. Initially, they have been studied because of their ability to improve surface hardness and wear resistance. Recently, the FeN thin films have been widely investigated since they show a variety of structures and magnetic properties. All nitrides with the composition of FexN (x≥3) are ferromagnetic and stable at room temperature. In particular, α″Fe16N2 phase is the most important compound and can be a possible candidate for highdensity magnetic recording media owing to its very high magnetic moment even higher than that of pure iron. However, up to now, little research has been done to investigate the dynamical scaling behavior of iron nitride films sputtered on glass to determine its universality class although dynamic scaling may be a useful method for understanding the formation of structure of the thin films. There are three types of growth morphologies: layer by layer growth, unstable growth, and selfaffine surface. Solid films grown under far from equilibrium conditions are predicted to have selfaffine surfaces, and the roughness can be characterized by appealing to a dynamic form. Moreover, the KPZ equation has proven to be a universal equation for real surface growth phenomena only on the basis of computer simulations. There is nearly no unambiguous experimental demonstration of KPZ growth. In this study, we deposited iron nitride thin films by DC magnetron sputtering at mixed Ar/N2 discharges(N2 fraction of 5%,10%,30%,50%, respectively) and different times(160,30,20,10,5min) in order to study their kinetic scaling behavior. The composition of the films was analyzed using Xray photoelectron spectroscopy experiment (XPS). The layer phases and surface morphology of the films were characterized using grazing incidence Xray scattering and Xray diffraction as well as atomic force microscopy. For the film grown at N2 fraction of 30% and 50%, the phase of FeN appears, if the N2 fraction is 10%, the phase of eFe3N is formed, while the phase of FeN0056 occurs for the film deposited at N2 fraction of 5%. The surface of the films deposited at N2 fraction of 5%showed a selfaffine character. The values of roughness exponent α≈065 and growth exponent β≈053±002 are in agreement with the improvised KPZ exponents based on Kolmogorov's energy cascade concept.

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