Abstract:An imaging polarimeter is developed for measuring polarization properties of hyper number aperture (NA) lithography tools, which can be represented by stokes entrance-pupil, stokes exit-pupil and mueller pupil of projection optics. This imaging polarimeter is optimized from the following three aspects. Firstly, a new method is proposed to measure stokes entrance-pupil of projection optics. It employs a rotating-waveplate and a fixed-polarizer as polarization state analyzer (PSA). Compared to the method proposed by Nomura, the number of measurements is reduced from 16 to 4 times. Additionally, the large incident angle in the mask plane leads to unacceptable retardation error of conventional waveplate, which terribly influent the measurement accuracy of the imaging polarimeter. Therefore, the imaging polarimeter can be optimized by employing a wide-view-angle (WVA) waveplate composed of quartz and sapphire plates. An example of 632.8nm WVA λ/4 waveplate is designed based on least square algorithm, which is firstly introduced to calculate the thicknesses of four crystal plates. Simulation result shows that the retardation error is less than 0.3° for incident angle within 20°. Thirdly, the WVA waveplate is successfully fabricated and its retardation is calibrated by senarmont method. Measurement data is contributed to eliminate the uncertainty of retardation and thus improves the performance of the imaging polarimeter. Because of the lack of lithography equipment, the imaging polarimeter is preliminarily tested in the visible optical system with a He-Ne laser. Stokes entrance-pupil, stokes exit-pupil and mueller pupil of projection optics are all measured with quite enough measurement repeatability.

Polarization Aberration In-Situ Measurement in Lithography Tools

Polarization Aberration Measurement of Lithographic Tools

Polarization aberration analysis in lithographic tools

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Measuring the Polarization Aberration of Hyper-Na Lens from the Vector Aerial Image

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Polarization Aberration Measurement Method Based on Principal Component Analysis of Differential Aerial Images

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Polarization Aberration Compensation Method by Adjusting Illumination Partial Coherent Factors in Immersion Lithography

Rigorous Imaging-Based Measurement Method of Polarization Aberration in Hyper-Numerical Aperture Projection Optics.

Generalized method for probing ideal initial polarization states in multibeam Lloyd's mirror interference lithography of 2D scale gratings

Aberration Calibration in High-Na Spherical Surfaces Measurement on Point Diffraction Interferometry

Image Based Method For Aberration Measurement Of Lithographic Tools

Polarization Aberration Control for Hyper-Na Lithographic Projection Optics at Design Stage

A Method for Compensating the Polarization Aberration of Projection Optics in Immersion Lithography

A Nonlinear Measurement Method of Polarization Aberration in Immersion Projection Optics by Spectrum Analysis of Aerial Image.

Polarization Aberrations in High-Numerical-Aperture Lens Systems and Their Effects on Vectorial-Information Sensing

In Situ Aberration Measurement Technique Based on Quadratic Zernike Model