Abstract:Engineering fast and reliable nanostructures with small feature size from the self‐assembly of giant surfactants is appealing in next‐generation lithography. Herein, well‐defined line nanopatterns with sub 10 nm feature size can be fabricated via directed self‐assembly of PS‐b‐oDMS7POSS, giving small feature size from self‐assembly and excellent etching contrast for reactive ion etching to create topographic nanopatterns for aimed lithographic applications. This work pioneers to combine fast self‐assembly of polyhedral oligomeric silsesquioxanes (POSS) nanocage‐based giant surfactants with high etching contrast and directed self‐assembly for reliable long‐range lateral order to create well‐aligned sub‐10 nm line nanopatterns via reactive ion etching (RIE). Polystyrene‐block‐oligo(dimethylsiloxane) substituted POSS (PS‐b‐oDMS7POSS) with seven oligo(dimethylsiloxane) at the corners of the POSS nanocage and one polystyrene (PS) tail is designed and synthesized as a giant surfactant with self‐assembly behaviors like block copolymer (BCP). In contrast to BCP, oDMS7POSS gives a volume‐persistent "nanoatom" particle with higher mobility for fast self‐assembly and higher segregation strength with PS for smaller feature size. By taking advantage of directed self‐assembly using nano‐trench fabricated by electron beam lithography, well‐ordered nanostructured monolayer with well‐aligned parallel oDMS7POSS cylinders can be formed by confined self‐assembly within the nano‐trench. With the optimization of the RIE treatment using O2 as an etchant, the high etching contrast from the oDMS7POSS and PS gives the formation of well‐defined line nanopatterns with sub‐10 nm critical dimension that can serve as a mask for pattern transfer in lithography. These results demonstrate a cost‐effective approach for nanopatterning by utilizing a creatively designed giant surfactant with sub‐10 nm feature size and excellent etching contrast for modern lithographic applications.

Towards Achieving a Large-Area and Defect-Free Nano-Line Pattern Via Controlled Self-Assembly by Sequential Annealing

A Facile Method of Forming Nanoscale Patterns on Poly(ethylene Glycol)-Based Surfaces by Self-Assembly of Randomly Grafted Block Copolymer Brushes.

Highly Tunable Complementary Micro/Submicro-Nanopatterned Surfaces Combining Block Copolymer Self-Assembly and Colloidal Lithography.

Directed Self‐Assembly of Polystyrene‐Block‐Polyhedral Oligomeric Silsesquioxane Monolayer by Nano‐Trench for Nanopatterning

Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via Solvent Annealing

Unidirectionally aligned line patterns driven by entropic effects on faceted surfaces

Nanostructured grating patterns over a large area fabricated by optically directed assembly.

Directed Self‐Assembly of Polystyrene‐Block‐Polyhedral Oligomeric Silsesquioxane Monolayer by Nano‐Trench for Nanopatterning (Small 48/2024)

Large-Scale Assembly of Colloidal Nanoparticles and Fabrication of Periodic Subwavelength Structures

Ultrafast Fabrication of Large‐Area Colloidal Crystal Micropatterns Via Self‐Assembly and Transfer Printing

Large-Scale, Long-Range-Ordered Patterning of Nanocrystals Via Capillary-Bridge Manipulation.

Sequential Self-Assembly of Polystyrene- block-Polydimethylsiloxane for 3D Nanopatterning via Solvent Annealing

Self-Assembled Silica Nanotrench Arrays Using Surfactant Templates

Well-ordered Self-Assembled Nanostructures of Block Copolymer Films Via Synergistic Integration of Chemoepitaxy and Zone Annealing

Large-Area Nanosphere Self-Assembly by a Micro-Propulsive Injection Method for High Throughput Periodic Surface Nanotexturing

Combining Double Patterning with Self-Assembled Block Copolymer Lamellae to Fabricate 10.5 Nm Full-Pitch Line/space Patterns

Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification

Facile and Scalable Patterning of Sublithographic Scale Uniform Nanowires by Ultra-Thin AAO Free-Standing Membrane

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

A Study on the Fabrication of Nanostructures with High Aspect Ratio and Large Area Uniformity

Flexible and Speedy Preparation of Large-Scale Polystyrene Monolayer Through Hemispherical-Depression-Assisted Self- Assembling and Vertical Lifting