Photodetection of CVD-Grown MoSe2 Monolayer Devices in Infrared Range

Min-Wei Chang,Ming-Yen Lu,Hsiang-Chen Wang
DOI: https://doi.org/10.1149/ma2016-02/34/2226
2016-01-01
ECS Meeting Abstracts
Abstract:Recently, two-dimensional transition metal dichalcogenides (TMDs), such as MoS2, MoSe2, and WSe2, have bandgaps changing from indirect to direct for multi- to mono-layer. In this work, we successfully synthesized the highly-crystalline MoSe2 monolayers on 300nm SiO2/Si using chemical vapor deposition (CVD) method in atmosphere, the growth setup is illustrated in Fig. 1, an alumina boat containing Se powder located upstream of the furnace and another alumina boat with MoO3 powder located at the center of the heating zone, which is 20 cm away from the Se powder. Cleaned 300 nm SiO2/Si substrate were placed downstream near MoO3 powder. The heating zone was heated to 750oC at a rate of 20oC/min. After the temperature was reached, the heating zone was kept for 10 min then naturally cooled to room temperature. Atomic force microscopy (AFM) and Raman spectroscopy confirmed that the as-grown MoSe2 layers are ranging from single layer to multilayers by means of controllable parameters. Transmission electron microscopy (TEM) analysis showed the single-crystallinity of MoSe2 layers with the perfect hexagonal lattice. Moreover, MoSe2 monolayer has a direct bandgap of 1.5 eV, which is close to the optimal bandgap value of infrared photodetectors (IRPDs), the fast and ultrasensitive photodetection of MoSe2 monolayer devices was demonstrated. This technique is expected to have potential use in future ultracompact near-infrared photodetectors and optical memory devices. Figure 1
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