Local Field Enhancement Characteristics In A Tapered Metal-Coated Optical Fiber Probe For Nanolithography
jianlei cui,lijun yang,yang wang,xuesong mei,wenjun wang,chaojian hou,bai cheng,qiang dai
DOI: https://doi.org/10.1080/10584587.2015.1044874
2015-01-01
Integrated Ferroelectrics
Abstract:In the nanolithography, some exciting developments have been motivated by the tapered metal-coated optical fiber probe irradiated by ultra-fast pulse laser. To explore the related mechanism, the local field is studied using the finite element method in this paper. The simulation results show the reflection at the cut-off plane, edge enhancement effect and surface plasmon resonance become the major factors affecting the near-field. In addition, Based on the near-field distribution and characteristics, the new promising scheme is proposed for near-field nanolithography.