Characterizing Errors of Integrated Optical Phase-Shifting Interferometer by P2VM Method

Menghua Niu,Xinchen Deng,Xinyue Liu,Haoran Meng,Shiyong Wang,Kejiang Zhou,Gang Chen,Yinlei Hao
DOI: https://doi.org/10.1117/12.2607109
2021-01-01
Abstract:Integrated optical phase-shifting interferometer is one of key devices that are frequently employed in astronomical interference instruments to measure complex coherent function of celestial object at certain spatial frequency, and further to achieve high-resolution imaging by synthetic aperture technology in last decades. Due to the presence of device fabrication error, calibration of an interferometer is indispensable, Pixel-to-Visibility Matrix (P2VM) method being a conventional approach. Up to present days, the P2VM is employed as a "all-in-one" method, which unify all device errors into one single matrix. However, characterization of device fabrication error at its various parts is often desired, to provide the basis for device optimization. In the current paper, a process to retrieve fabrication errors of the three main parts of the phase-shift interferometer, from an experimentally measured Pixel-to-Visibility Matrix (V2PM) is demonstrated. The results are expected to be useful in the process of optimizing the device structure and its manufacturing parameters.
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