Abstract:While the phase separation of binary mixtures of chemically different polymer-grafted nanoparticles (PGNPs) is observed to superficially resemble conventional polymer blends, the presence of a "soft" polymer-grafted layer on the inorganic core of these nanoparticles qualitatively alters the phase separation kinetics of these "nanoblends" from the typical pattern of behavior seen in polymer blends and other simple fluids. We investigate this system using a direct immersion annealing method (DIA) that allows for a facile tuning of the PGNPs phase boundary, phase separation kinetics, and the ultimate scale of phase separation after a sufficient "aging" time. In particular, by switching the DIA solvent composition from a selective one (which increases the interaction parameter according to Timmerman's rule) to an overall good solvent for both PGNP components, we can achieve rapid switchability between phase-separated and homogeneous states. Despite a relatively low and non-classical power-law coarsening exponent, the overall phase separation process is completed on a time scale on the order of a few minutes. Moreover, the roughness of the PGNP blend film saturates at a scale that is proportional to the in-plane phase separation pattern scale, as observed in previous blend and block copolymer film studies. The relatively low magnitude of the coarsening exponent n is attributed to a suppression of hydrodynamic interactions between the PGNPs. The DIA method provides a significant opportunity to control the phase separation morphology of PGNP blends by solution processing, and this method is expected to be quite useful in creating advanced materials.The Supporting Information is available free of charge at <a class="ext-link" href="/doi/10.1021/acsnano.1c03357?goto=supporting-info">https://pubs.acs.org/doi/10.1021/acsnano.1c03357</a>.AFM images for as-cast and thermally annealed films, AFM images for as-cast films with different PMMA-SiO2/PS-SiO2 mass ratios, 1D power spectrum, ToF-SIMS profiles, in situ AFM image, discussion on ToF-SIMS sputtering energy, discussion on the coarsening exponent (<a class="ext-link" href="/doi/suppl/10.1021/acsnano.1c03357/suppl_file/nn1c03357_si_001.pdf">PDF</a>)This article has not yet been cited by other publications.

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