Dielectric Properties Of K And Mg Alternately Doped Bst Films With High Doped Concentration

Zhang Weifang,Liao Jiaxuan,Huang Jiaqi,Wei Xiongbang,Wu Mengqiang
2015-01-01
Rare Metal Materials and Engineering
Abstract:Mg-doped, K-doped and Mg/K alternately doped BST films with high doped concentration have been prepared on Si/SiO2/Ti/Pt wafers by an improved sol-gel method. The dielectric properties of the films have been studied. XRD shows that the films exhibit cubic perovskite structures. High doped concentration is easy to refine the grains and promotes acceptor doping, but makes the crystallization of K doped BST film weak, that of Mg doped film equivalent and that of Mg/K-BST film enhanced. Mg/K-BST films show increasing lattice parameters and decreasing grains with increasing layer number, and 6-layer film corresponds to the strongest crystallization. SEM indicates that the surface morphologies of the alternately doped films are between those of K doped films and Mg doped films, and approach to those of Mg doped film with increasing layer number, and the cross-sectional SEM morphologies of the films are dense and getting denser with increasing layer number. C-V measurement reveals that tunability and dielectric loss of the K doped film are high, those of the Mg doped film are low, and those of the alternately doped film are moderate and optimized with the increasing doped concentration and/or layer number, meeting the needs of microwave tunable applications.
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