X-ray Wavefront Characterization with Grating Interferometry Using an X-Ray Microfocus Laboratory Source

Zhao Shuai,Wang Ke-yi,Cheng Guang-yu,Shen Yuan,Wang Yu-shan,Zhang Lei
DOI: https://doi.org/10.1117/12.2576152
2020-01-01
Abstract:In this paper, we present an interferometric method to measure the shape of X-ray wavefront and the slope error of optical elements using microfocus x-ray source. According to the fractional Talbot effect, we built an x-ray grating interferometer for x-ray wavefront characterization at the working wavelength. The interferometer consists of a phase grating as a beam splitter and an absorption grating as a transmission mask for the detector. however, the determination of the relation between x-ray grating interferometer system parameters and the sensitivity, which is influenced by many optical elements in the system, is crucial for the optimization of the setup. It is very complicated to determine the best optical parameters in the course of experiment. The interferometry system is abstracted into a linear system, and then a mathematical model is constructed. The influence of different physical parameters, such as the source size and the energy spectrum, on the functional capability of an x-ray grating interferometer applied for X-ray wavefront characterization is discussed using numerical simulations based on Fresnel diffraction theory. The slope variations can be detected with an accuracy better than 100nrad.
What problem does this paper attempt to address?