Large-scale Fabrication of CMOS-compatible Silicon-OLED Heterojunctions enabled Infrared Upconverters

Tianyu Rao,Qun Hao,Ge Mu,Tianling Qin,Yimei Tan,Pengfei Zhao,Dexi Kong,Menglu Chen,Xin Tang
DOI: https://doi.org/10.1063/5.0138070
IF: 3.5
2023-02-17
Physics Today
Abstract:Infrared-to-visible upconverters have widespread application prospects, including bioimaging, night vision, and defense security. A typical upconverter is generally constructed by integrating an infrared photodetector (PD) detecting low-energy infrared with a visible light-emitting diode (LED) emitting high-energy visible light. However, when photocarriers transport through the interface between PD and LED, lateral current spreading inevitably presents, which leads to optical cross-talking and hinders the realization of high-resolution and large-area infrared imaging. Here, near-infrared (NIR) upconverters are fabricated via the integration of silicon (Si) NIR detectors with organic LED (OLED) by complementary-metal-oxide-semiconductor compatible manufacturing processes. The pixelated indium tin oxide (ITO) electrodes introduced as the interfacial carrier transfer channel effectively suppress lateral current spreading and ensure that the photogenerated carrier of PD could transport into the OLED with well-defined spatial resolution. The Si-OLED upconverters possess wafer-level luminous area and large-scale fabrication capacity and realize high-resolution infrared imaging with a resolution as high as 3629 dpi. By changing the organic luminescent layer of OLED, the Si-OLED upconverters could emit red/ green/ blue visible light under NIR illumination with a low turn-on voltage of 3 V and excellent upconversion efficiency of 9.2%. Furthermore, the large-area Si-OLED upconverters exhibit flexibility with an infrared upconversion ability even under bending.
physics, multidisciplinary
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