Fabrication and electrical characteristics of carbon nanotube-based microcathodes for use in a parallel electron-beam lithography system
K. B. K. Teo,M. Chhowalla,G. A. J. Amaratunga,W. I. Milne,P. Legagneux,G. Pirio,L. Gangloff,D. Pribat,V. Semet,Vu Thien Binh,W. H. Bruenger,J. Eichholz,H. Hanssen,D. Friedrich,S. B. Lee,D. G. Hasko,H. Ahmed
DOI: https://doi.org/10.1116/1.1545755
2003-01-01
Abstract:This article presents an overview of the "Nanolith" parallel electron-beam (e-beam) lithography approach. The e-beam writing head consists of an array of microguns independently driven by an active matrix complementary metal-oxide-semiconductor circuit. At the heart of each microgun is a field-emission microcathode comprised of an extraction gate and vertical carbon nanotube emitter, whose mutual alignment is critical in order to achieve highly focused electron beams. Thus, in this work, a single-mask, self-aligned technique is developed to pattern the extraction gate, insulator, and nanotubes in the microcathode. The microcathode. examined here (150 x 150 gates, 2 mum gate diameter, with multiple nanotubes per gate) exhibited a peak current of 10.5 muA at 48 V when operated with a duty cycle of 0.5%. The self-aligned process was extended to demonstrate the fabrication of single nanotube-based microcathodes with submicron gates. (C) 2003 American Vacuum Society.