A method of generating a pattern on a substrate

Miao Xiang-Shui,Chua Eng Keong,Chong Chun Yang,Shi Lu-Ping,Li Jianming,Ng Lung Tat,Yuan Gaoqiang
2009-01-01
Abstract:A method of generating a desired pattern on a substrate, and a pattern on a substrate formed using the method. The method comprises forming a resist structure on the substrate, wherein the resist structure comprises at least a metallic glass thermal absorption layer, irradiating the resist structure with an energy beam, and developing the irradiated resist structure to form the desired pattern.
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