Adsorption of Cu2+and Cd2+onto Msio2-Ida

SHI Xue-wei,CHANG Hui,ZHAO Shuang-liang,XU Shou-hong
DOI: https://doi.org/10.14135/j.cnki.1006-3080.20070412003
2018-01-01
Abstract:Because of the non-degradability of heavy metal ions and their serious injury to the human body,removal of heavy metal ions in industrial waste water has become very urgent.The adsorption method is widely used due to simple operation,low cost,and less secondary pollution.Mesoporous SiO2 with a high specific surface,good thermal stability and mechanical property becomes a good metal adsorbent.In this study,mesoporous SiO2functionalized by iminodiacetic acid(IDA)(mSiO2-IDA)was prepared to explore the adsorption of Cu2+and Cd2+.The prepared mSiO2-IDA was analyzed and characterized by elemental analysis(EA)and FT-IR spectroscopy,which confirmed that IDA was successfully grafted on the surface of mSiO 2.The effect of solution pH,initial metal ion concentration and time on the adsorption of Cu2+and Cd2+onto mSiO2-IDA was studied.The capacity of adsorption changed with the increase of pH,the maximum adsorption appeared at pH =5.Then the kinetics of adsorption at pH=5 was studied.The adsorption rates and capacity reached the maximum within 30 min.Besides,the adsorption capacity of mSiO2-IDA at different initial concentrations was studied.Adsorption capacity increased with the increase of initial concentrations and the highest adsorption capacities were 49.0 mg/g and 43.5 mg/g for Cu2+and Cd2+respectively.It was concluded that the removal efficiency of Cu2+and Cd2+achieved 97.9% and 92.1% within 30 min respectively at pH=5 by 2 g/L mSiO2-IDA.Meanwhile, in order to determine the adsorption rate constant and explore adsorption mechanism of mSiO 2-IDA to Cu2+and Cd2+,their data of adsorption kinetics were fitted.The adsorption behavior was better described by pseudo-second-order equation,and the adsorption isotherm followed Langmuir one.As revealed by X-ray photoelectron spectroscopy(XPS),the adsorption mechanisms of Cu2+and Cd2+onto mSiO2-IDA are different.mSiO2-IDA showed a good adsorption performance to Cu2+and Cd2+.
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