Design and test of macro-micro coupling system for dual-stage lithography

WU Jian-wei,YUAN Yong,CUI Ji-wen,LIU Yong-meng,TAN Jiu-bin
DOI: https://doi.org/10.3788/OPE.20152306.1673
2015-01-01
Optics and Precision Engineering
Abstract:To reduce the swap time of wafer stage in a dual-stage lithography,and to guarantee the connection reliability between a long stroke system and the wafer stage,a macro-micro coupling system of dual-stage lithography was designed.On the basis of compliance mechanical theory,the fast gripper of coupling system was designed to realize the compactedness of the system,and its locking force was analyzed.A flexible mechanism of the fast gripper was designed,including a flexible lever and a clamp reset unit,then they were analyzed by finite element method.The pneumatic system in the fast gripper was designed.To guarantee the rapidity and safety in the locking process of coupling device,the pneumatic system could realize three dynamic locking process,and complete the buffer locking of the fast gripper.Finally,the experiments of clamp motion test and the clamping force test were performed.Experimental results indicate that the stroke of the clamp is greater than 2 mm,which meets the safety needs of stroke system and wafer stage.Moreover,the opening time and fast buffer closing time of the clamp coupling mechanism are 350 ms and 850 ms respectively,and can bearXdirection driving force more than 700 N.The coupling system ensures the reliability of the working process and rapidity of wafer stage swap process.
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