Epitaxial Graphene on Si-face High Purity Semi-Insulating 4H-SiC Substrates

Kaili MAO,Yanfei HU,Yingmin WANG,Bin LI,Gaoyang ZHAO
DOI: https://doi.org/10.14176/j.issn.1001-3474.2017.02.001
2017-01-01
Abstract:It is a challenge to fabricate large area and high quality graphene on high purity semiinsulating SiC substrate.Meanwhile,it is important to confirm and characterize the properties of epitaxial graphene.The growth technology of large area graphene on SiC substrates was studied by examining the effects of growth pressure,temperature,and graphitization time on the quality of epitaxial graphene.The surface morphology and material structure of the epitaxial graphene were characterized with laser Raman spectroscopy,atomic force microscope,and field emission scanning electron microscopy,respectively.It is concluded that the high quality and continuous graphene material has formed on SiC at 1 650 ℃ for 2 h with a pressure of 500 Pa.The peak width at half height (FWHM) of the 2D peak in the Raman spectrum of this epitaxial graphene is about 34 cm1,and could be fit with single peak Lorenz,which predict the formation of monolayer graphene.
What problem does this paper attempt to address?