Study on Sputtering Yield of Hall Thruster Discharge Chamber Wall

Zhi-yuan ZHANG,Li YAN,Ping-yang WANG,Jian-jun WU

DOI: https://doi.org/10.13675/j.cnki.tjjs.2015.03.023

2015-01-01

Abstract:Discharge chamber wall erosion caused by the accelerated low energy (less than 300eV) ions bombardment is a key factor affecting Hall thruster lifetime. In order to obtain the sputtering yield of the material (BNSiO2) used in the discharge chamber wall,a real Hall thruster provided the xenon ion with 275eV bombard?ment of targets in a vacuum chamber. The effects of incident angle on the sputtering yield were investigated by us?ing the weighting method. The sputtering yield caused by the lower energy ion bombardment is hard to be mea?sured precisely and expensive, time-consuming. In order to overcome this shortcoming, the SRIM software, which is based on the Monte Carlo (MC) method,was used to investigate the influences of the incident angle and ion energy on the sputtering yield within the scope of the low ion energy (less than 300eV) . The parame?ters of SRIM were corrected according to the previous experimental data. The experimental results of reference were used to verify the simulating results. After that, the effects of incident angle and ion energy on sputtering yield were investigated. The results show the sputtering yield increased first and then decreased with the incident angle increasing. Under the condition studied, the sputtering yield always decreases as the ion energy decreas?ing,but when the ion energy is less than 100eV,it gradually moves towards the same and a small value.