The preparation and investigation of all thin film electrochromic devices based on reactively sputtered MoO<sub>3</sub> thin films

Qiaonan Han,Rui Wang,Hongbing Zhu,Meixiu Wan,Yaohua Mai
DOI: https://doi.org/10.1016/j.mssp.2021.105686
IF: 4.1
2021-01-01
Materials Science in Semiconductor Processing
Abstract:Reactively sputtered molybdenum trioxide (MoO3) thin films were systematically investigated and employed as cathodic electrochromic layers in all thin film electrochromic devices (ATF-ECDs). The gas loop controller was employed for adjustment of inputted oxygen gas flux by monitoring the target voltage during reactive sputtering. The working pressure played a great role on the deposition rate, crystallite size, optical properties and the electrochromic properties of MoO3 and the applied ATF-ECDs (soda lime glass (SLG)/ITO/NiOX/Ta2O5/MoO3/ITO). A 4 Pa MoO3 based ATF-ECD achieved a high optical modulation (transmission @ 600 nm) of similar to 50% and a high coloration efficiency of 149.4 cm(2)/C.
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