Direct in situ photolithography of ultra-stable CsPbBr3 quantum dot arrays based on crosslinking polymerization
Yanli Wan,Yixing Zhao,Yaling Li,Zhenwei Zhang,Sen Li,Tingfang Tian,Li Wang
DOI: https://doi.org/10.1039/d3nr04876d
IF: 6.7
2023-12-26
Nanoscale
Abstract:CsPbX3 (X=Br, Cl, I) perovskite quantum dots (PQDs) are the rising star for various display applications, owing to their excellent opto-electrical properties, such as adjustable spectrum, narrow emission linewidth and high quantum yield. However, these PQDs are well-known to suffer from their intrinsic instability in atmospheric conditions. In this work, a novel photosensitive ligand, phenylbis(2,4,6-trimethylbenzoyl)-phosphine oxide (XBPO), was employed as a dual-functional reagent for PQDs surface engineering. The XBPO ligand could cleave to produce the phenylphosphinyl radical and the trimethylbenzoyl radicals under UV light irradiation. The phenylphosphinyl radical with P=O bond could effectively passivate the PQDs surface defects, leading to quantum yield improvement. The CsPbBr3 and the CsPbI3 PQDs with XBPO modification could achieve a photoluminescence quantum yield (PLQY) of near unity and 92%, respectively. Additionally, the in-situ encapsulation of the PQDs was achieved by the subsequent crosslinking polymerization, which significantly improved the stability of PQDs against solvents and the environment. By combining a standard photolithography procedure, we demonstrated a micro-pattern of CsPbBr3 PQDs. These results establish a universal route for PQD patterning, compatible with the existing photolithography processes, which could facilitate the application of PQDs in the next-generation display technology.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology,chemistry