Abstract:The TiSiN/Ag multilayer coatings with bilayer periods of ~50, 65, 80, 115, 150, and 410 nm have been deposited on Ti6Al4 V alloy by arc ion plating. In order to improve the adhesion of the TiSiN/Ag multilayer coatings, TiN buffer layer was first deposited on titanium alloy. The multi-interfacial TiSiN/Ag layers possess alternating TiSiN and Ag layers. The TiSiN layers display a typical nanocrystalline/amorphous microstructure, with nanocrystalline TiN and amorphous Si 3 N 4 . TiN nanocrystallites embed in amorphous Si 3 N 4 matrix exhibiting a fine-grained crystalline structure. The Ag layers exhibit ductile nanocrystalline metallic silver. The coatings appear to be a strong TiN (200)-preferred orientation for fiber texture growth. Moreover, the grain size of TiN decreases with the decrease of the bilayer periods. Evidence concluded from transmission electron microscopy revealed that multi-interfacial structures effectively limit continuous growth of single (200)-preferred orientation coarse columnar TiN crystals. The hardness of the coatings increases with the decreasing bilayer periods. Multi-interface can act as a lubricant, effectively hinder the cracks propagation and prevent aggressive seawater from permeating to substrate through the micro-pores to some extent, reducing the friction coefficient and wear rates. It was found that the TiSiN/Ag multilayer coating with a bilayer period of 50 nm shows an excellent wear resistance due to the fine grain size, high hardness, and silver-lubricated transfer films formed during wear tests.

The Interface Characteristics of TiN(100)/MgO(100) Multilayer on Oxidized Si(100) Substrate Via First-Principle Calculations and Experimental Investigation

Atomic and Electronic Structure of the TiN/MgO Interface from First Principles

Parameters Synergism in the Preparation of TiN(100) Transition Layer with High Structural Integrity on Si(100): First‐principles Calculations and Experimental Investigations

Influence of multi-interfacial structure on mechanical and tribological properties of TiSiN/Ag multilayer coatings

Ab initio calculations on the Mg/TiN heterogeneous nucleation interface

Binding of an Oxide Layer to a Metal: The Case of Ti(101̅0)/TiO2(100)

In Situ Scanning Tunneling Microscopy Studies of the Evolution of Surface Morphology and Microstructure in Epitaxial TiN(001) Grown by Ultra-High-vacuum Reactive Magnetron Sputtering

Binding of an Oxide Layer to A Metal: the Case of Ti(10(1)Over-Bar0)/Tio2(100)

Interface diffusion and reaction between Ti layer and Si3N4/Si substrate

Stability of the Al/TiB2 Interface and Doping Effects of Mg/Si

Interface Study on the Effect of Oxygen/nitrogen Ratio in Ni/Ti Multilayer Deposited by Reactive Sputtering

Interface diffusion and reaction between Ti layer and Si<sub>3</sub>N<sub>4</sub>/Si substrate

An Investigation of the TiOx–SiO2/Mo(1 1 2) Interface

The Effect of Impurities on the Adhesion Behavior of TiN(1 1 1)/Α-Ti(0 0 0 1) Semi-Coherent Interface: A First-Principles Investigation

First-principles investigation on the atomic structure, stability and electronic property of O(001)/B2(110) interface in Ti2AlNb alloys

Nucleation and growth mechanisms of ferrite on Mg-Ti-oxide surfaces: First-principles investigation

Atomic scale structure and electronic property of the interface

Effect of the Modulation Ratio on the Interface Structure of TiAlN/TiN and TiAlN/ZrN Multilayers: First-principles and Experimental Investigations

Effect of Nb Doping on Electronic Structure of TiO2/NiTi Interface: A First-Principle Study

Theoretical analysis of Si3N4/TiC interfacial properties and material preparation

Tuning Mechanical Properties of TiAlSiN/TiAlN Multilayers by Interfacial Structure