Highly Tunable and Ultrasensitive Hybrid Plasmonic Platform for Multi-Spectral Sensing: Non-invasive Diabetes Surveillance and Global Warming Directives
Yingting Yi,Yougeng Yi,Mengqiu Long,Zao Yi,Liang Bian,Gongfa Li,Liangcai Zeng,Hailiang Li
DOI: https://doi.org/10.1016/j.optcom.2023.129697
IF: 2.4
2023-01-01
Optics Communications
Abstract:The development of tunable and extremely sensitive devices, as well as the emergence of metamaterials, has tremendously aided the evolution of plasmonic sensing technologies. However, the natural property of metamaterials severely restricts the scalability and application potential of mono-functional sensor systems. To address this shortcoming, we have investigated an ultranarrow five-band plasmonic sensor with structural tunability and high sensing behaviors in compatibility with multi-purpose application scenarios, using the finite-difference time-domain approach rigorously. Meanwhile, we theoretically formulated a hybridization model for the mutual induction of Fabry–Pérot resonances and localized surface plasmon polariton resonance, providing a theoretical basis for the utilization and conception of the highly-sensitive tunable plasmonic sensor. Most notably, we discovered and interpreted far-field phase extinction inducing separation of polarization resonance peaks in physical mechanisms. The tunability of its mutual inductance effect at the intersection distances from two-intersecting silver nanogroove was adequately exploited to further validate and effectively attain five ultra-narrow absorptivities of 96.70%, 93.93%, 99.73%, 100.00%, and 89.72% by top-level optimization. In addition, the redundant proximity between nearby peaks is compensated, extending the operating band and enhancing the practicability in multi-purpose scenarios. As a reliable source for future optical sensing, it performs well in the visible to near-infrared region, enabling detection response to non-invasive diabetes mellitus, global climate warming, and unrestricted temperature and pressure measurement. Meanwhile, minimum FWHM = 4.806 nm and maximum FOM = 115.13 RIU−1 are obtained at 293.15 K, with an associated highest sensitivity of 557.93 nm/RIU. Moreover, the fabrication technologies development of electron beam lithography and focused ion beam etching technologies enables large-scale mass production at low cost and long-term stability.