Effect of hot electron blast force on ultrafast laser ablation of nickel thin film (vol 54, pg 1737, 2015)

Yonggang Shen,Yong Gan,Wanjun Qi,Yaogen Shen,Zhen Chen
DOI: https://doi.org/10.1364/AO.54.003216
IF: 1.9
2015-01-01
Applied Optics
Abstract:The ablation depths of a 200 nm thick nickel film by ultrafast lasers were simulated and improperly compared with the existing numerical results for a bulk nickel target in our paper [Appl. Opt. 54, 1737 (2015)]. The ultrafast laser ablation of a 1 mu m thick nickel film is, therefore, simulated here, which demonstrates that the conclusions in our published paper are not affected and that the adopted 1 mu m film is sufficiently thick to be used for the simulation of the ablation behavior of a bulk nickel target subject to 1 ps laser irradiation. (C) 2015 Optical Society of America
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