Electromagnetic Fields and Antenna Impedance Analysis of an RF Ion Source at HUST

Peng Zhao,Dezhi Chen,Dong Li,Chen Zuo

DOI: https://doi.org/10.1063/1.5053305

2018-01-01

Abstract:Huazhong University of Science and Technology (HUST) is developing an RF based negative ion source. Numerical simulations of the 1 MHz RF driver have been performed using ANSYS HFSS. Differing from conventional inductively coupled plasma (ICP) source simulations, which exclude Faraday screen (FS) for simplifying analysis, our simulation model contains FS and employs a complete 3D model for reproducing the realistic electromagnetic fields in the driver. It is found that the FS suppresses effectively the axial electric field, hence diminishes the capacitive coupling between the antenna and the plasma. The simulations without and with plasma have also been performed by approximating the plasma as a homogeneous electrically conducting medium. It is found that the existence of plasma further enhances the azimuthal electric field in the plasma volume, which enhances the inductive coupling between the antenna and plasma. The equivalent antenna impedance loaded without and with plasma has been analysed. As the plasma conductivity increases, the antenna inductance decreases, while the antenna resistance firstly rises and then declines, which indicates that the RF power transfer gets obstructed at high input power and high plasma density. The measured antenna impedance at no plasma is much closer to the simulation result in the model containing FS rather than excluding FS, which somehow verifies the validity of this model.