Effects of Rapid Thermal Annealing on Telecom C-band InAs Quantum Dots on InP (100) Grown by Droplet Epitaxy

Chak Lam Chan,Elisa Maddalena Sala,Edmund M Clarke,Jon Heffernan
DOI: https://doi.org/10.1088/1361-6463/ad835d
2024-10-05
Journal of Physics D Applied Physics
Abstract:We demonstrate the effects of rapid thermal annealing (RTA) on emission from telecom C-band InAs/InP (100) quantum dots (QDs) grown by droplet epitaxy in Metal-Organic Vapour Phase Epitaxy (MOVPE). Room temperature photoluminescence (RT-PL) from the QD ensemble shows a tuned emission wavelength through the C-band and O-band while improving the emission intensity by ~4.5 times at an annealing temperature of 770°C. A blueshift of the QD emission up to 430 nm has been achieved. Low-temperature micro-photoluminescence (LT-μPL) demonstrates bright single QD emission from the annealed samples with an improvement in linewidth of up to 30%.
physics, applied
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