A First-Principle Study on the Formation and Migration of AlH3 Defect on (1 1 2) NaAlH4 Surface

Chuan Liu,Pan Guo,Yulong Qiao,Shengli Zhang
DOI: https://doi.org/10.1016/j.chemphys.2020.110871
IF: 2.552
2020-01-01
Chemical Physics
Abstract:The formation and migration of AlH3 defect is suggested to be the rate-limiting step in the early stage of the dehydrogenation of NaAlH4. This paper presents a first-principles calculations on studying the formation and migration of AlH3 defect in (1 1 2) NaAlH4 surface. We find that AlH3 defect tends to be formed closer to the surface, in particular in the top layer. The AlH52- unit, which is suggested as a precursor of the dehydrogenation, is formed preferably in the second layer. The reorientation of AlH52- unit results in the complete diffusion of AlH3 defect. The migration of AlH3 defect along (1 1 2) surface is an exothermic process, yielding a barrier of 0.38 eV.
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