(Invited) Atomic Layer Deposition for Catalyst “Bottom-Up” Synthesis

Junling Lu
DOI: https://doi.org/10.1149/07506.0085ecst
2016-01-01
ECS Transactions
Abstract:Atomic layer deposition (ALD) has appeared as a new promising method of design and synthesis of supported catalysts. The nature of self-limiting surface reactions of ALD makes possible to precisely "bottom-up" construct catalytic materials on high-surface-area supports with well-defined structures in a cyclic manner. This provides insights for fundamental understanding of reaction mechanisms and structure-activity relations, and facilitates rational design of advanced catalysts with high performance. Here we summarize our recent attempts to synthesize supported metal catalysts using ALD. The capability of achieving precise control over the particle size, structure and composition metal nanoparticles is emphasized. In addition, applying metal oxide ALD onto metal nanoparticles to tailor the catalytic performance of metal catalysts including activity, selectivity and stability are also discussed.
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