Hals : our future light source at nsrl *

Wang Lin,Li Wei-min,Feng Gaung-yao,Zhang Shan-cai,Bai Zheng-he,Xu Hong-liang,Wu,Cong-feng,Liu Zu-ping

2010-01-01

Abstract:Hefei Light Source (HLS) is a second generation VUV light source, whose performance is limited by large beam emittance and less insertion devices and can’t meet the requirements of synchrotron radiation experiments. One year ago, the concept of Hefei Advanced Light Source (HALS) was brought forward, whose purpose is to produce VUV and soft X-ray synchrotron radiation with high brilliance and good lateral coherence. In the preliminary design study, a medium scale storage ring composed of multi bend acromat focusing structure was adopted to achieve ultra low beam emittance, less than 0.2nm·rad. In this paper, the optimization of linear and nonlinear optical parameters was introduced. The onmomentum and off-momentum dynamic aperture is large enough for bean injection. The transverse momentum aperture is larger than ±3% for acceptable beam lifetime. Finally, the expected brilliance of synchrotron radiation was calculated by SPECTRA code. INTRODUCTION Hefei Light Source at NSRL is a dedicated second generation VUV and soft X-ray source, designed and constructed twenty years ago. The main parameters of HLS are listed in Table 1. With the fast development of synchrotron radiation experimental techniques, the brilliance of HLS can’t meet the requirements of synchrotron radiation application research. The beam emittance and number of insertion device are two limiting factors of HLS storage ring. Table 1: Main Parameters of HLS