Pulsed Electron-Beam Melting of Cu-Steel 316 System : Evolution of Chemical Composition and Properties 1

V. P. Rotshtein,A. B. Markov,Yu. F. Ivanov,K. V. Karlik,B. V. Uglov,A. K. Kuleshov,M. V. Novitskaya,S. N. Dub,Y. Pauleau,F. Thièry,I. A. Shulepov
2004-01-01
Abstract:The surface morphology, chemical composition, nanohardness, and tribological properties of a film (Сu)/substrate (stainless steel 316) system subjected to pulsed melting with a lowenergy (20–30 keV) high-current electron beam (2– 3 μs, 2–10 J/cm) have been investigated. The film was deposited by sputtering a Cu target in the Ag plasma of a microwave discharge. To prevent the local delamination of the film due to cratering, the substrates were repeatedly pre-irradiated with 8– 10 J/cm. Single pulsed melting of this system results in the formation of a diffusion layer of thickness 120–170 nm near the interface, irrespective of the energy density. In contrast, an increase in number of pulses increases the thickness of this layer. For single irradiation, the nanohardness and the average wear rate of the surface layer of thickness 0.5–1 μm, including the molten film and the diffusion layer, nonmonotonically vary with energy density, reaching, respectively, a maximum and a minimum in the range of 4.3–6.3 J/cm.
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