The effect of interlayer reactivity on the quality of diamond coating by HFCVD deposition

Jihua Peng,Jiwei Zeng,Chao Xiong,Liejun Li
DOI: https://doi.org/10.1016/j.jallcom.2020.155035
IF: 6.2
2020-01-01
Journal of Alloys and Compounds
Abstract:Five kinds of interlayers are prepared on the surface of 6 wt% Co tungsten carbide cement substrate, then approximately 1 mu m thick diamond coating is deposited onto these specimens by means of hot filament chemical deposition (HFCVD). The quality of the interlayer, as-nucleated, and as-grown diamond coatings are characterized using X-ray diffraction, scanning electron microscopy, Raman spectroscopy, and Rockwell hardness test. It is found that the aluminum chromium nitride (AICrN) interlayer is much more thermally stable and less reactive with the adsorbed carbon atoms than other interlayers, namely Cr, WC, Cr + WC, and Ti + WC. This determines the efficiency of depressing Co out by diffusion to the top surface to become strengthened according to the following order: Ti + WC < Cr < Cr + WC < WC < AICrN. The lesser the reactivity of the interlayer, the lesser the diamond nucleation density is, and the closer is the as-deposited coating to a perfect microcrystal like crystallite wherein the diamond phase dominates consequently. However, amorphous/nanograin like diamond coating is responsible for those interlayers with high reactivity, in which several sp2C exist. The adhesion strength of both microcrystal like and amorphous/nanograin like as-deposited coatings is inversely proportional to the interlayer reactivity. (C) 2020 Elsevier B.V. All rights reserved.
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