Non-volatile Memory Based on Atomic Crystals

LIU ChunSen,ZHOU Peng,ZHANG Wei
DOI: https://doi.org/10.1360/sspma2016-00206
2016-01-01
Abstract:The space and data-exchanging rate and other factors of storage, calculation and communication in the multi-functional low-power chips have become the bottlenecks of the development of integrated circuits. The ultralow power consumption of single-bit erasing/writing, the ultra-small device size, fast operation time and non-volatility are indispensable for high-density and high-speed storage in the future system architecture to satisfy the needs for big data exchanging in the core. The future storage technology consists of employing devices with new principles, such as controlling of electron transition and ionic migration superseding the electron transport, adopting new materials to lower the power consumption and introducing new 3D-stack technology to increase the density. This review focuses on the application of new materials in the non-volatile storage technology, especially the two-dimensional atomic crystals. Two-dimensional atomic crystals have some prominent properties, such as high electron mobility, ultimate ultrathin channel and ultralow surface states with an intrinsic thickness of 0.6‒1.2 nm and abundant band structure, which provide an excellent solution for future storage technology. And they have enormous potential to further scale down to increase the integration level and improve stability, expand the application scenarios and develop new memory devices and they are a new method to break through the bottlenecks of power consumption and integrated level of memories.
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