Abstract:Over the past years, nanostructured metalenses with thin form factors have been extensively studied for their potential in consumer and industrial applications. Despite significant advancements, current metalenses struggle to achieve high numerical aperture (NA), manufacturable structures, broad working bandwidth, and extended depth of focus (DOF) simultaneously. This paper introduces a comprehensive inverse design framework that facilitates the rapid development of polarization-insensitive 3D metalenses, effective in both frequency and spatial domains. The framework employs shape-constrained topology optimization to define horizontal ring profiles, along with discrete particle swarm optimization to manage discretized ring heights. Two immersed silicon carbide metalenses are demonstrated to showcase this framework's capability, providing near-unity NAs for enhanced photon collection. The first design is an extended DOF metalens, exhibiting a DOF over four times the light wavelength and achieving a maximum diffraction efficiency of 23%, close to the theoretical limit. The second design achieves broadband achromaticity, suppressing chromatic aberrations across a wide 300 nm bandwidth (850-1150 nm) while maintaining an average diffraction efficiency of 10%. This methodology serves as a valuable tool for deploying functional metalenses with implications for nanophotonics, quantum optics, and quantum nanotechnology. An effective inverse design framework for polarization-insensitive 3D metalenses, optimized for frequency and spatial domains is introduced. Using shape-constrained topology optimization and discrete particle swarm optimization, silicon carbide metalenses with extended-depth-of-focus and broadband achromaticity is developed across a 300 nm bandwidth, achieving maximum diffraction efficiencies of 23% and 13.6%, respectively. These designs have promising applications in nanophotonics and quantum optics. image

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