Abstract:High-power impulse magnetron sputtering (HiPIMS) is a new magnetron sputtering technique which can produce high-density plasmas with a high ionization rate and prepare coatings with a good performance such as large density and high adhesion. To obtain stable discharge and universal materials' ionization rates, a cylindrical cathode is proposed based on the hollow cathode effect. However, the unusual plasma transport results in a large loss of ions and a low deposition rate. To solve these problems, an expanding electromagnetic field is proposed to control the plasma transport in this work. The particle in cell/Monte Carlo collision (PIC/MCC) method and the plasma diffusion model are used to simulate the plasma transport in and out of the cylindrical cathode with different currents in the electromagnetic coils, respectively. The simulation results reveal that different electromagnetic fields can achieve different plasma density distributions, resulting in different accumulated positions and different diffusion paths. When the coil current is positive, the resistance to axial motion of electrons is small but the resistance to radial motion is large, so that the hollow cathode effect is weakened and the plasma beam tends to output uniformly. When the coil current is negative, the resistance to axial motion of electrons is large but the resistance to radial motion is small, so that the hollow cathode effect is enhanced and the plasma tends to gather on the central axis and then diffuses outward. To verify the simulation results, Ar/Cr HiPIMS discharge experiments are carried out with the cylindrical cathode in a homemade vacuum system. The experiment results indicate that the threshold voltage, the plasma flow shape, the optical emission spectrum (OES) intensity, and the deposition distribution are determined by the electromagnetic coil current. The variation tendency is in coincidence with the prediction of the simulation. Consequently, by adding an expanding electromagnetic field, the plasma discharge in the cylindrical cathode can be easily controlled and the deposition rate is greatly enhanced. This electromagnetic control strategy not only realizes the enhancement and effective control of plasma, but also improves the homogeneity and the deposition rate of the coatings, thus laying a foundation for the industrial application of HiPIMS.

Modeling of Plasma Density, Argon Ion Energy and Ion Velocity Functions in a Dipolar Electron Cyclotron Resonance Plasma Source

A hybrid model for low pressure inductively coupled plasmas combining a fluid model for electrons with a plasma-potential-dependent energy distribution and a fluid-Monte Carlo model for ions

Modeling of magnetron sputtering plasmas

Modeling and simulation of ion energy distribution functions in technological plasmas

Ion energy distribution functions in a dual-frequency low-pressure capacitively-coupled plasma: experiments and particle-in-cell simulation

Numerical Simulation of Plasma Plume with an Insulated Wall in Sheath Region Using a DSMC-PIC Parallel Algorithm

Kinetic simulations of low-pressure inductively coupled plasma: an implicit electromagnetic PIC/MCC model with the ADI-FDTD method

Monte Carlo Simulations of Argon Ion Transport in the Downstream Region of Electron Cyclotron Resonance Plasmas

Simulation Study on Plasma Discharge and Transport in Cylindrical Cathode Controlled by Expanding Electromagnetic Field

Modeling on plasma energy balance and transfer in a hollow cathode

Investigation of Ion Energy Distributions with Two Positive Ions in a Dual-Frequency Sheath of Plasma Etching

Three-dimensional simulations of ion dynamics in the plasma of an Electron Cyclotron Resonance Ion Source

Coupled plasma transport and electromagnetic wave simulation of an ECR thruster

High-efficient Particle-in-cell/monte Carlo Model for Complex Solution Domain Andsimulation of Anode Layer Ion Source

Three-dimensional modelling of processes in Electron Cyclotron Resonance Ion Source

Self-Consistent Kinetic Modeling of Electron Distribution Function in a Low-Pressure Inductively Coupled Plasma

Particle-based simulation of atom and ion transport in HiPIMS: effect of the plasma potential distribution on the ionized flux fraction

Direct Implicit and Explicit Energy-Conserving Particle-in-Cell Methods for Modeling of Capacitively-Coupled Plasma Devices

Geometric Particle-In-Cell discretizations of a plasma hybrid model with kinetic ions and mass-less fluid electrons

Self-Consistent Kinetic Modeling of Low-Pressure Inductively Coupled Radio-Frequency Discharges

Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/MCC simulations of capacitively coupled plasmas