New Application of P-N Junction in Electrochemical Detection: the Detection of Heavy Metal Ions

Jinghua Shang,Minggang Zhao,Huiyan Qu,Hui Li,Rongjie Gao,Shougang Chen
DOI: https://doi.org/10.1016/j.jelechem.2019.113624
IF: 4.598
2019-01-01
Journal of Electroanalytical Chemistry
Abstract:The 3D Ni/NiO/MoO3/chitosan foam was fabricated and the interfacial barrier of p-n junction was proposed as a driving factor for electrochemical detection of Cu2+. The electrochemical response resulted from the decreased barrier height caused by the absorbed Cult The liner range (0-25 mu M) and the lower detection limit (5.69 nM) were obtained. The direct electrochemical detection of Cu2+ in real water sample with excellent stability and recovery was achieved. It affords a new approach to achieve the direct electrochemical detection of metal ions with depressed interference by employing the interfacial effects of p-n junction.
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