Photoredox-Mediated Remote C(sp3)–H Heteroarylation of N-Alkyl Sulfonamides

Zhiqiang Deng,Guo-Xing Li,Gang He,Gong Chen
DOI: https://doi.org/10.1021/acs.joc.9b02502
2019-01-01
The Journal of Organic Chemistry
Abstract:A Minisci-type delta-selective C(sp(3))-H heteroarylation of sulfonyl-protected primary aliphatic amines with N-heteroarenes under photoredox-catalyzed conditions was developed. The reaction typically uses a slight excess of amine reactant. The use of benziodoxole acetate (BI-OAc) oxidant and hexafluoroisopropanol solvent is critical to achieve high yield. Besides methylene C-H bonds, heteroarylation reactions of delta methyl C-H bonds also worked under more forced conditions. The reactions show a broad scope for both amine and N-heteroarene substrates, offering a straightforward method for synthesis of complex delta-heteroarylalkylmines from simple precursors.
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