Broadband N+−n Photodiode Based on Tellurium-Doped Black Silicon Fabricated by Femtosecond Laser Filament

Yue Su,Danwen Yao,Siqi Wang,XuePeng Zhan,Huailiang Xu
DOI: https://doi.org/10.1016/j.optlastec.2019.105913
IF: 4.939
2019-01-01
Optics & Laser Technology
Abstract:Tellurium-doped black silicon with the absorptance of > 85% over the wide range of 240-2500 nm is rapidly fabricated at a standoff distance of 1 m by ablating a tellurium-film-coated crystalline silicon wafer with a femtosecond laser filament. After an annealing temperature of 873 K, the black silicon is further prepared as an n(+) - n photodiode. By measuring the dark-current-bias and photocurrent-bias dependences of the diode at three representative light wavelengths ranged from visible to infrared, it is found that the photodiode shows good rectification and photosensitivity characteristics with a responsivity of 445 mA/W at 650 nm, 56 mA/W at 808 nm, and 15 mA/W at 1550 nm at 8 V bias. Our results show the first attempt in fabricating photodiode based on femtosecond filament standoff texturing of silicon, and open up a way towards rapid and large-scale fabrication of infrared optoelectronic devices.
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