Solution Processed ZnSnO Thin-film Transistors with Peroxide- Aluminum Oxide Dielectric.

T. S. Zhao,C. Zhao,C. Z. Zhao,W. Y. Xu,L. Yang,I. Z. Mitrovic,S. Hall,E. G. Lim,S. C. Yu
DOI: https://doi.org/10.1109/icicdt.2019.8790915
2019-01-01
Abstract:In this work, we investigate an fabricating route of solution-processed thin-film transistors (TFTs). The high-k dielectric layers of aluminum oxide (AlO) were optimized through hydrogen peroxide (H 2 O 2 ). With Zn incorporation in tin oxide (SnO) semiconductor layer, the ZnSnO TFT with a field effect mobility of 4.3 cm 2 ·V -1 ·s -1 , a threshold voltage of 2 V, a subthreshold swing of 0.16 V/dec and an on/off ratio of 10 6 .
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