Abstract:This paper deals with the control design of a wafer stage setup, catering for the increasing demand for ultra-precision positioning and high throughput devices in line with further miniaturization of the LCD, semiconductor and electronic parts. The developed wafer stage employs a dual stroke principle: a short stroke for fine positioning and a long stroke for coarse positioning. The short stroke is a stage of six-degree-of-freedom with integrated magnetic bearing to counteract the gravity, while the long stroke is a planar motion stage consisting of a integrated three-axis drive motor, which can move along the surface of the Halbach permanent magnet array without generating friction due to being elevated with air bearings. To achieve precision tracking control with zero settling time under high acceleration/velocity motion, iterative learning control has been regarded as an effective means. Linear iterative learning control techniques attenuate the recurring disturbances and amplify the nonrecurring, suffering from a fixed trade-off between convergence rate and noise amplification. In this paper, a frequency dependent amplitude-based nonlinear iterative learning control is proposed. Within a frequency range of interest, the learning gain is continuously updated to improve the control performance of the planar motion stage. Based on the frequency contents of error signal, for error-levels beyond a predefined threshold, additional learning gain will be effectively used to diminish the low-frequency tracking error. Below the threshold, the original low-gain value is maintained to avoid high-frequency noise amplification. Performance assessment on the developed wafer stage setup shows that the proposed nonlinear iterative learning strategy can realize a remarkable performance which includes nanometer positioning and tracking over large travel ranges, and provides a more desirable means to deal with the convergence rate and noise amplification.

Segmented lterative Compensation Strategy under Scanning Track

Segmented iterative learning control strategy for wafer scanner systems

Iterative learning control for dual stroke actuator systems

Learning Control for Motion Coordination in Wafer Scanners: Toward Gain Adaptation

Study on Control Strategy for Coarse/fine Dual-Stage of Step and Scan Lithography

Effective non-causal learning control for wafer scanner systems

Frequency Dependent Nonlinear Iterative Learning Control With Application To A Wafer Stage

A Parallel Inverse-Model-Based Iterative Learning Control Method for a Master-Slave Wafer Scanner.

Ultra-precision Motion Control and Synchronization Control for Stage of Lithography

Iterative Learning Control for the Synchronization Control System of the Scanner

Trajectory Planning and Precision Control of Scan-move for Step-scan Lithography Stage

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Cross-coupling Control for Synchronized Scan of Experimental Wafer and Reticle Stage

A cascaded iterative learning motion control scheme for an ultra-precision dual-stage actuated wafer stage

Motion Control of Wafer Scanners in Lithography Systems: from Setpoint Generation to Multi-Stage Coordination

A Data-Driven Variable-Gain Control Strategy for an Ultra-Precision Wafer Stage with Accelerated Iterative Parameter Tuning

Research on a joint mechanical and electrical simulation platform of a step-and-scan lithography based on the state-space finite element model

Segmented Compensation Using Compound Iterative Learning Control on 2D System for Linear Motor

Ultra-Precision Motion Stage Control Technology for IC Lithography

Design of Coarse-fine Control System for Wafer Stage of Lithography Based on PQ Method

Design of a synchronization control system for lithography based on repetitive control method