Growth Kinetics of Ni3Sn4 in the Solid–Liquid Interfacial Reaction

Yue Wang,Jihua Huang,Zheng Ye,Xianwen Peng,Jian Yang,Shuhai Chen,Xingke Zhao
DOI: https://doi.org/10.1007/s11661-019-05259-0
2019-01-01
Abstract:A kinetic model of Ni3Sn4 growth in a solid (Ni)–liquid (Sn solution saturated with Ni) interfacial reaction was established, and a kinetic equation of $$ l^{\text{IMC}} = 0.58\sqrt {\tilde{D}t} $$ was derived, which coincided with the experimental parabolic growth behavior. The Ni-Sn interdiffusion coefficient in Ni3Sn4 ( $$ \tilde{D} $$ ) was obtained as $$ \tilde{D} = 7.61 \times 10^{ - 12} \exp \left( { - \frac{{24.76\; {\text{kJ}}/{\text{mol}}}}{RT}} \right) $$ by combining the kinetic equation with kinetic experiments conducted at different temperatures. The developed model can predict the thickness of the Ni3Sn4 layer well.
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