Abstract:With the advancement of very large scale integrated circuits (VLSI) technology nodes, lithographic hotspots become a serious problem that affects manufacture yield. Lithography hotspot detection at the post-OPC stage is imperative to check potential circuit failures when transferring designed patterns onto silicon wafers. Although conventional lithography hotspot detection methods, such as machine learning, have gained satisfactory performance, with the extreme scaling of transistor feature size and layout patterns growing in complexity, conventional methodologies may suffer from performance degradation. For example, manual or ad hoc feature extraction in a machine learning framework may lose important information when predicting potential errors in ultra-large-scale integrated circuit masks. We present a deep convolutional neural network (CNN) that targets representative feature learning in lithography hotspot detection. We carefully analyze the impact and effectiveness of different CNN hyperparameters, through which a hotspot-detection-oriented neural network model is established. Because hotspot patterns are always in the minority in VLSI mask design, the training dataset is highly imbalanced. In this situation, a neural network is no longer reliable, because a trained model with high classification accuracy may still suffer from a high number of false negative results (missing hotspots), which is fatal in hotspot detection problems. To address the imbalance problem, we further apply hotspot upsampling and random-mirror flipping before training the network. Experimental results show that our proposed neural network model achieves comparable or better performance on the ICCAD 2012 contest benchmark compared to state-of-the-art hotspot detectors based on deep or representative machine leaning.

Faster Region-based Hotspot Detection.

Hotspot Detection Via Multi-task Learning and Transformer Encoder

Lithographic Hotspot Detection Based on SVM and Genetic Algorithm

Hotspot Detection Via Attention-Based Deep Layout Metric Learning

Lithography Hotspot Detection Based on Heterogeneous Federated Learning with Local Adaptation and Feature Selection

Efficient Hotspot Detection Via Graph Neural Network

Modified Deep Learning Approach for Layout Hotspot Detection

Lithography Hotspot Detection Via Heterogeneous Federated Learning with Local Adaptation

Feature Fusion Based Hotspot Detection with R-EfficientNet

Lithography Hotspot Detection Using a Double Inception Module Architecture

LithoHoD: A Litho Simulator-Powered Framework for IC Layout Hotspot Detection

Automated and Agile Design of Layout Hotspot Detector via Neural Architecture Search

Lithography Hotspot Detection Method Based on Transfer Learning Using Pre-Trained Deep Convolutional Neural Network

DRC Hotspot Prediction at Sub-10nm Process Nodes Using Customized Convolutional Network

Bridging the Gap Between Layout Pattern Sampling and Hotspot Detection via Batch Active Learning

Efficient Layout Hotspot Detection Via Neural Architecture Search

An Efficient Approach for DRC Hotspot Prediction with Convolutional Neural Network.

Lightweight Hotspot Detection Model Fusing SE and ECA Mechanisms

Litho-NeuralODE 2.0: Improving Hotspot Detection Accuracy with Advanced Data Augmentation, DCT-based Features, and Neural Ordinary Differential Equations

Efficient Layout Hotspot Detection Via Binarized Residual Neural Network

Imbalance aware lithography hotspot detection: a deep learning approach