Frequency dependence of plasma characteristics at different pressures in cylindrical inductively coupled plasma source

Zeyu Hao,Jian Song,Yue Hua,Gailing Zhang,Xiaodong Bai,Chunsheng Ren

DOI: https://doi.org/10.1088/2058-6272/ab1035

2019-01-01

Abstract:The effects of driving frequency on plasma parameters and electron heating efficiency are studied in cylindrical inductively coupled plasma (ICP) source. Measurements are made in an Ar discharge for driving frequency at 13.56/2 MHz, and pressures of 0.4-1.2 Pa. In 13.56 MHz discharge, higher electron density (n(e)) and higher electron temperature (T-e) are observed in comparison with 2 MHz discharge at 0.6-1.2 Pa. However, slightly higher n(e) and T-e are observed in 2 MHz discharge at 0.4 Pa. This observation is explained by enhanced electron heating efficiency due to the resonance between the oscillation of 2 MHz electromagnetic field and electron-neutral collision process at 0.4 Pa. It is also found that the variation of T-e distribution is different in 13.56 and 2 MHz discharge. For ICP at 13.56 MHz, T-e shows an edge-high profile at 0.4-1.2 Pa. For 2 MHz discharge, T-e remains an edge-high distribution at OA 0.8 Pa. However, the distribution pattern involves into a center-high profile at 0.9-1.2 Pa. The spatial profiles of n(e) remain a center-high shape in both 13.56 and 2 MHz discharges, which indicates the nonlocal kinetics at low pressures. Better uniformity could be achieved by using 2 MHz discharge. The effects of gas pressure on plasma parameters are also examined An increase in gas pressure necessitates the rise of n(e) in both 13.56 and 2 MHz discharges. Meanwhile, T-e drops when gas pressure increases and shows a flatter distribution at higher pressure.