Radiofrequency and 2.45 GHz Electron Cyclotron Resonance H−volume Production Ion Sources

O. Tarvainen,S. X. peng
DOI: https://doi.org/10.1088/1367-2630/18/10/105008
2016-01-01
New Journal of Physics
Abstract:The volume production of negative hydrogen ions ( H ) in plasma ion sources is based on dissociative electron attachment (DEA) to rovibrationally excited hydrogenmolecules (H2), which is a two-step process requiring both, hot electrons for ionization, and vibrational excitation of theH2 and cold electrons for the H formation throughDEA. Traditionally H ion sources relying on the volume production have been tandem-type arc discharge sources equippedwith biasedfilament cathodes sustaining the plasma by thermionic electron emission andwith amagnetic filter separating themain discharge from the H formation volume. Themainmotivation to develop ion sources based on radiofrequency (RF) or electron cyclotron resonance (ECR) plasma discharges is to eliminate the apparent limitation of the cathode lifetime. In this paper we summarize the principles of H volume production dictating the ion source design and highlight the differences between the arc discharge and RF/ECR ion sources fromboth, physics and technology point-of-view. Furthermore, we introduce the state-of-the-art RF and ECR H volume production ion sources and review the challenges and future prospects of these yet developing technologies.
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