Abstract:Diblock copolymers with ordered mesophase structures have been used as templates for nano-fabrication. Unfortunately, the ordered structure only exists at micromete rscale areas, which precludes its use in many advanced applications. To overcome this disadvantage, the diblock copolymer confined in a restricted system with a patterned surface is proved to be an effective means to prohibit the formation of defects and obtain perfect ordered domains. In this work, the morphologies of a thin film of diblock copolymer confined between patterned and neutral surfaces were studied by dissipative particle dynamics. It is shown that the morphology of the symmetric diblock copolymer is affected by the ratio of the pattern period on the surface to the lamellar period of the symmetric diblock copolymer and by the repulsion parameters between blocks and wall particles. To eliminate the defects in the lamellar phase, the pattern period on the surface must match the lamellar period. The difference in the interface energy of different compartments of the pattern should increase with increasing film thickness. The pattern period on the surface has a scaling relationship with the chain length, which is the same as that between the lamellar period and the chain length. The lamellar period is also affected by the polydispersity of the symmetric diblock copolymer. The total period is the average of the period of each component multiplied by the weight of its volume ratio. The morphologies of asymmetric diblock copolymers are also affected by the pattern on the surface, especially when the matching period of the asymmetric diblock copolymer is equal to the pattern period, which is approximately equal to the lamellar period of a symmetric diblock copolymer with the same chain length.

Striped patterns self-assembled from rod–coil diblock copolymers on spherical substrates

Mechanisms of Ordering in Striped Patterns

Self-assembly of Cyclic Rod-Coil Diblock Copolymers

Surface-induced Morphologies of Lamella-Forming Diblock Copolymers Confined in Nanorod Arrays.

Surface-field-induced Microstructures of Asymmetric Diblock Copolymer Nanoparticles

Concentric lamella structures of symmetric diblock copolymers confined in cylindrical nanopores

Strip-Pattern-Spheres Self-Assembled from Polypeptide-Based Polymer Mixtures: Structure and Defect Features

Dynamics of Pattern Coarsening in a Two-Dimensional Smectic System.

Defect Structures and Ordering Behaviours of Diblock Copolymers Self-Assembling on Spherical Substrates

Adsorption and Ordering of Amphiphilic Rod-Coil Block Copolymers on a Substrate: Conditions for Well-Aligned Stripe Nanopatterns.

Hybrid Patterns from Directed Self-Assembly of Diblock Copolymers by Chemical Patterns.

Morphologies of Diblock Copolymer Confined in a Slit with Patterned Surfaces Studied by Dissipative Particle Dynamics

Perfectly Ordered Patterns Via Corner-Induced Heterogeneous Nucleation Of Self-Assembling Block Copolymers Confined In Hexagonal Potential Wells

Ordering Stripe Structures of Nanoscale Rods in Diblock Copolymer Scaffolds

Self-Assembled Pattern Formation of Block Copolymers on the Surface of the Sphere Using Self-Consistent Field Theory

Self-assembly of Rod-Coil Block Copolymers on a Substrate into Micrometer-Scale Ordered Stripe Nanopatterns

Dissipative Particle Dynamics Simulation on the Self-Assembly of Linear Abc Triblock Copolymers under Rigid Spherical Confinements

Fabrication of Virus-Like Particles with Strip-Pattern Surface: A Two-Step Self-Assembly Approach

Dot Nanopattern Self‐Assembled from Rod‐Coil Block Copolymer on Substrate

Defective morphologies kinetically formed in diblock copolymers under the cylindrical confinement

Perfectly Ordered Patterns Formed by a Heterogeneous Nucleation Process of Block Copolymer Self-Assembly Under Rectangular Confinement