Monte Carlo Simulations of Kα Source Generated by Hot Electrons-Nanobrush Target Interactions

Jincui Zhao,Jianhua Zheng,Lihua Cao,Zongqing Zhao,Shu Li,Yuqiu Gu,Jie Liu
DOI: https://doi.org/10.1063/1.4962186
IF: 2.2
2016-01-01
Physics of Plasmas
Abstract:We focus on the transport processes from hot electrons to Kα x-ray emission in a copper nanobrush target. The physics on the enhancement of Kα photon yield and conversion efficiency from laser to Kα x-ray ηL→Kα is studied by combining Monte Carlo simulations and previous particle-in-cell simulation results. Simulation results show that Kα photon yield and electron-Kα photon conversion efficiency ηe−→Kα from nanobrush targets rise gradually and then stay nearly constant. Kα photon yield from the structured nanobrush target increases with peak number density n0, but the yield is a little less than that from the same-size planar target when the electron temperature T=400 keV and n0=1021 cm−3. It is because the number density of atoms and ions in the nanobrush target is almost one half of the foil target. Compared to the planar target, Kα photons after the nanobrush target are more than those before the target. Because it is easier for the electrons to enter the structured target surface, and Kα x-ray source is produced in the deeper position of the structured nanobrush target. Considering the realistic number of hot electrons produced by laser-nanobrush and -planar targets interaction, Kα photon yield in nanobrush targets has a significant enhancement of over 2–6 folds relative to laser-foil irradiation. The yield and ηL→Kα from the nanobrush target are, respectively, 5.42×109 sr−1 and 7.32×10−5 when laser strength Iλ2≈2×1018 W cm−2 μm2. The yield and ηL→Kα decrease gradually with the laser strength, but the values are always higher than that from the planar target. Therefore, the laser-nanobrush target interaction can produce brighter and smaller-size Kα photon source, compared to a planar target.
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